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Summary
| Description |
English: Scanning electron microscope (SEM) picture of a single silicon spike (as in black silicon) after a deep reactive ion etch process of silicon
Deutsch: Rasterelektronenmikroskopaufnahme (REM) von "Silicium-Nadel", wie sie beim Schwarzen Silicium vorkommen. Herstellung durch Reaktives Ionentiefenätzen (DRIE) von Silicium (ASE-Prozess) |
| Date | |
| Source | Christoph Kubasch (2005) |
| Author | Christoph Kubasch (2005) |
| Other versions |
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 14:04, 17 April 2009 | | 640 × 487 (18 KB) | Cepheiden | {{Information |Description={{en|1=Scanning electron microscope (SEM) picture of a single silicon spike (as in black silicon) after a deep reactive ion etch process of silicon }} {{de|1=Rasterelektronenmikroskopaufnahme (REM) von "Silicium-Nadel", wie sie |
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