File:Lift-off (microtechnology) process.svg

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Description
English: The image illustrates the Lift-off process used in microfabrication mostly to create metallic interconnects.

I. Preparation of the substrate II. Deposition of the sacrificial stencil layer III. Patterning the sacrificial layer (ex. etching), creating an inverse pattern IV. Depostion of the target material V. Washing out the sacrificial layer together with the target material on its surface VI. Final pattern 1) Substrate 2) Sacrificial layer

3) Target material
Date 07.04.2008
Source Own work
Author Twisp

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Date/TimeThumbnailDimensionsUserComment
current19:10, 14 December 2009Thumbnail for version as of 19:10, 14 December 2009512 × 664 (31 KB)Cepheidenoptimized
02:08, 7 April 2008Thumbnail for version as of 02:08, 7 April 2008625 × 837 (61 KB)Twisp{{Information |Description= {{en|The image illustrates the Lift-off process used in microfabrication mostly to create metallic interconnects. I. Preparation of the substrate II. Deposition of the sacrificial stencil layer III. Patterning the sacrificial

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