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File:Spinner.jpg

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Description
English: A spinner is used to apply a thin even coating of photoresist to a silicon wafer so that the pattern on a photomask can be transferred and a circuit can be fabricated. The image shows a wafer of 6" (125 mm) diameter that has been mounted on the vacuum chuck and is ready for spinning. The user dispenses a drop of photoresist in the center of the wafer and the centrifugal force spreads the fluid into an even film, eliminating excess photoresist at the edge of the wafer in the process.
Note that the light in the room really is yellow.
Source Photo taken at HP Labs by Alison Chaiken.
Author Alison Chaiken
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This licensing tag was added to this file as part of the GFDL licensing update.
w:en:Creative Commons
attribution share alike
This file is licensed under the Creative Commons Attribution-Share Alike 2.5 Generic, 2.0 Generic and 1.0 Generic license.
You are free:
  • to share – to copy, distribute and transmit the work
  • to remix – to adapt the work
Under the following conditions:
  • attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
  • share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.
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0.03787878787878787878 second

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Date/TimeThumbnailDimensionsUserComment
current16:19, 29 November 2014Thumbnail for version as of 16:19, 29 November 2014641 × 823 (63 KB)SelakantColour correction and contrast enhancement.
02:23, 3 February 2006Thumbnail for version as of 02:23, 3 February 2006641 × 823 (62 KB)ChaikenA '''spinner''' is used to apply a thin even coating of photoresist to a silicon wafer so that the pattern on a photomask can be transferred and a circuit can be fabricated. The i

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