Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound with the formula Si[OSi(CH3)3]4. This colourless liquid is used as a reagent in organic synthesis.[2]
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| Names | |
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| Preferred IUPAC name
Tetrakis(trimethylsilyl) silicate | |
| Identifiers | |
3D model (JSmol)
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| Abbreviations | TTMS |
| ChemSpider | |
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PubChem CID
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| UNII | |
CompTox Dashboard (EPA)
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| Properties | |
| C12H36O4Si5 | |
| Molar mass | 384.841 g·mol−1 |
| Appearance | Colourless liquid |
| Density | 0.87 g cm−3[1] |
| Melting point | −60 °C (−76 °F; 213 K) |
| Boiling point | 103–106 °C (217–223 °F; 376–379 K) |
| Vapor pressure | 8.96 Pa (25°C) |
Refractive index (nD)
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1.389 |
| Hazards | |
| GHS labelling: | |
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| Warning | |
| H315, H319, H335, H413 | |
| P261, P264, P271, P273, P280, P302+P352, P304+P340, P305+P351+P338, P312, P321, P332+P313, P337+P313, P362, P403+P233, P405, P501 | |
| Flash point | 80 °C (176 °F; 353 K) |
| Related compounds | |
Related compounds
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Hexamethyldisiloxane |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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Application
editTTMS can be used for thin film coating with a nanostructured silicon dioxide prepared by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure.[3]
References
edit- ^ "TETRAKIS(TRIMETHYLSILOXY)SILANE - 3555-47-3".
- ^ Fleming, I (2002). Science of Synthesis: Houben-Weyl Methods of Molecular Transformations. Stuttgart: Georg Thieme Verlag. p. 1060. ISBN 3-13-112171-8.
- ^ Schäfer, J; Hnilica, J; Sperka, J; Quade, A; Kudrle, V; Foest, R; Vodak, J; Zajickova, L (2016). "Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure". Surface & Coatings Technology. 295 (295): 112–118. doi:10.1016/j.surfcoat.2015.09.047.